Al₂O₃ ceramic ESC

Temperature:
ambient temperature version (non-heating, with a chiller)
Features and applications:
Coulomb type, dual voltage level, etch-resistant, long service life, a good solution for Etch, PVD, CVD processes, and other conventional process equipment.

Al₂O₃ ceramic ESC

Temperature:
ambient temperature version (non-heating, with a chiller)
Features and applications:
Coulomb type, dual voltage level, etch-resistant, long service life, a good solution for Etch, PVD, CVD processes, and other conventional process equipment.

High-temperature Al₂O₃ ceramic ESC

Temperature:
high temperature version (-30–600℃)
Features and applications:
Coulomb type, dual voltage level, high temperature-resistant, a good solution for PVD, IMP processes, and other high-temperature process equipment.

Al₂O₃ ceramic ESC

Temperature:
ambient temperature version (heating, with a chiller)
Features and applications:
Coulomb type, dual voltage level, etch-resistant, long service life, a good solution for Etch, PVD, CVD processes, and other conventional process equipment.

Al₂O₃ ceramic ESC

Temperature:
ambient temperature version (non-heating, with a chiller)
Features and applications:
Coulomb type, dual voltage level, etch-resistant, long service life, a good solution for Etch, PVD, CVD processes, and other conventional process equipment.

Al₂O₃ ceramic ESC

Temperature:
ambient temperature version (heating, with a chiller)
Features and applications:
Coulomb type, dual voltage level, etch-resistant, long service life, a good solution for Etch, PVD, CVD processes, and other conventional process equipment.

High-temperature Al₂O₃ ceramic ESC

Temperature:
high temperature version (-30–600℃)
Features and applications:
Coulomb type, dual voltage level, high temperature-resistant, a good solution for PVD, IMP processes, and other high-temperature process equipment.

AlN ceramic ESC (OEM improved)

Temperature:
ambient temperature version (non-heating, with a chiller)
Features and applications:
Coulomb type, dual voltage level, etch-resistant, with excellent thermal conductivity, a good solution for Etch, PVD, CVD processes, and other conventional process equipment.