
Our Product
Al₂O₃ ceramic ESC (customized)
Temperature:
temperature-controlled version (non-heating, with a chiller)
Features and applications:
zone-based temperature control, a good solution for Etch, PVD, CVD, and similar process equipment requiring temperature-controlled bases.
Al₂O₃ ceramic ESC (customized)
Temperature:
temperature-controlled version (non-heating, with a chiller)
Features and applications:
zone-based temperature control, a good solution for Etch, PVD, CVD, and similar process equipment requiring temperature-controlled bases.
Al₂O₃ ceramic ESC (customized)
Temperature:
ambient temperature version (non-heating, with a chiller)
Features and applications:
Coulomb type, dual voltage level, etch-resistant, with excellent thermal conductivity, a good solution for Etch, PVD, CVD processes, and other conventional process equipment.
Temperature:
temperature-controlled version (non-heating, with a chiller)
Features and applications:
JR type, high adhesion force, with excellent thermal conductivity, low wafer surface temperature rise, a good solution for 8–12” Etch, PVD, and CVD processes.
Temperature:
temperature-controlled version (non-heating, with a chiller)
Features and applications:
JR type, zone-based temperature control, 8” to replace 12” ones, a good solution for Etch, CVD, and similar process equipment requiring temperature compensation.
Temperature:
ambient temperature version (non-heating, with a chiller)
Features and applications:
Coulomb type, dual voltage level, etch-resistant, long service life, a good solution for Etch (including SV) and other common process equipment.
Temperature:
ambient temperature version (non-heating, with a chiller)
Features and applications:
Coulomb type, dual voltage level, etch-resistant, long service life, a good solution for Etch (including SV) and other common process equipment.
Temperature:
ambient temperature version (non-heating, with a chiller)
Features and applications:
Coulomb type, dual voltage level, etch-resistant, long service life, a good solution for Etch (including SV) and other common process equipment.